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Description
Sputtering deposits thin, uniform layers of pure metal nanoclusters using argon plasma, avoiding colloid aggregation and enabling conductivity for nonconductive samples, However, it requires specialized equipment and skills for precise thickness control
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Surg Endosc (2006) 20:16714.10.1007/s00464-005-0660-1 35 ForbesJFryNHwangHKarimuddinAA
